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        <identifier>oai:www.ideals.illinois.edu:2142/21979</identifier>
        <datestamp>2023-07-10</datestamp>
        <setSpec>col_2142_5131</setSpec>
        <setSpec>col_2142_14789</setSpec>
        <setSpec>com_2142_5130</setSpec>
        <setSpec>com_2142_14788</setSpec>
        <setSpec>com_2142_8903</setSpec>
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      <metadata>
        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:creator>Gozum, John Ekrem</dc:creator>
          <dc:date>2011-05-07T13:25:06Z</dc:date>
          <dc:date>2011-05-07T13:25:06Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>1991</dc:date>
          <dc:description>Thin films of high purity palladium can be prepared at low temperature (250$\sp\circ$C) metal-organic chemical vapor deposition of bis(allyl)palladium or (cyclopentadienyl)(allyl)palladium.</dc:description>
          <dc:description>Metal sulfide films may be deposited from the precursors $\rm Fe\sb2S\sb2(CO)\sb6$ and Ti(S-t-Bu)$\sb4$ to give thin films of iron sulfide and titanium disulfide at low temperature.</dc:description>
          <dc:description>CVD of Ti(BH$\sb4)\sb3$(dme) at 200$\sp\circ$C resulted in deposition of thin films of TiB$\sb2$. The AES data establish the films as TiB$\sb{2.07}$ with less than 5% carbon and oxygen in the film interior.</dc:description>
          <dc:description>Passage of Zr(BH$\sb4)\sb4$ or Hf(BH$\sb4)\sb4$ through a hot zone at 250$\sp\circ$C resulted in deposition of thin films of MB$\sb2$.</dc:description>
          <dc:description>In order to trap some of the hydride species that may be formed from the CVD of Zr(BH$\sb4)\sb4$ and Hf(BH$\sb4)\sb4$, these precursors were thermolyzed in the presence of small alkyl phosphines. Treatment of the zirconium and hafnium tetrahydroborate complexes M(BH$\sb4)\sb4$ with trimethylphosphine yields crystals of the new polyhydride $\rm Zr\sb2H\sb3(BH\sb4)\sb5(PMe\sb3)\sb2$ and $\rm Hf\sb2H\sb3(BH\sb4)\sb5(PMe\sb3)\sb2$. Single crystal X-ray diffraction studies of the complexes reveal a distinctly asymmetric dinuclear structure bridged by three hydrogen atoms.</dc:description>
          <dc:description>Treatment of $\rm Zr(BH\sb4)\sb4$ or $\rm Hf(BH\sb4)\sb4$ with trimethylphosphine for extended reaction times has given two new polyhydrides of stoichiometry $\rm M\sb3H\sb6(BH\sb4)\sb6(PMe\sb3)\sb4$. The variable temperature $\sp1$H, $\sp{31}$P, and $\sp{11}$B NMR data suggest that these trinuclear compounds contain a non-cyclic M($\mu$-H)$\sb3$M($\mu$-H)$\sb3$M backbone with the phosphine and tetrahydroborate ligands distributed in 2:2:0 and 2:1:3 ratios among the three metal centers. This suggestion has been confirmed by a single crystal X-ray structure.</dc:description>
          <dc:description>Treatment of the M(BH$\sb4)\sb4$ complexes with the bidentate phosphine 1,2-bis(dimethyl-phosphino)ethane (dmpe) gives mononuclear hydrides of stoichiometry MH(BH$\sb4)\sb3$(dmpe)$\sb2$ or $\rm MH\sb2(BH\sb4)\sb2(dmpe)\sb2$ depending on the conditions.</dc:description>
          <dc:description>Treatment of the polyhydride complexes $\rm M\sb2H\sb3(BH\sb4)\sb5(PMe\sb3)\sb2$ with dmpe has given two new group 4 polyhydrides of stoichiometry $\rm M\sb2H\sb4(BH\sb4)\sb4(dmpe)\sb2$. The variable temperature NMR data suggest that these dinuclear compounds contain a M($\mu$-H)$\sb3$M backbone with the phosphine and tetrahydroborate ligands distributed in 2:0 and 1:3 ratios among the two metal centers; this has been confirmed by the single crystal X-ray structure. A terminal hydride is positioned in between the two bidentate dmpe ligands. A dynamic process exchanges these hydride environments, and a likely mechanism for this process has been proposed.</dc:description>
          <dc:description>Made available in DSpace on 2011-05-07T13:25:06Z (GMT). No. of bitstreams: 2
license.txt: 4922 bytes, checksum: 910b249b4beec47e7ab768910c8f966f (MD5)
9136603.pdf: 6988788 bytes, checksum: 5692848bb726e3d9049cba3c781541bd (MD5)
  Previous issue date: 1991</dc:description>
          <dc:description>Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T14:54:30Z
Item is restricted indefinitely.</dc:description>
          <dc:description>Restriction data tranferred 2014-07-01T11:25:20-05:00
Original Data
Group with Access UIUC Users [automated]
Release Date: none
Reason: ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:identifier>AAI9136603</dc:identifier>
          <dc:identifier>(UMI)AAI9136603</dc:identifier>
          <dc:identifier>http://hdl.handle.net/2142/21979</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:rights>Copyright 1991 Gozum, John Ekrem</dc:rights>
          <dc:subject>Chemistry, Inorganic</dc:subject>
          <dc:subject>Physics, Electricity and Magnetism</dc:subject>
          <dc:subject>Engineering, Materials Science</dc:subject>
          <dc:title>Transition metal allyls and hydrides as chemical vapor deposition precursors</dc:title>
          <dc:type>text</dc:type>
          <degree>
            <department>Chemistry</department>
            <discipline>Chemistry</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
          </degree>
        </thesis>
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