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oai:www.ideals.illinois.edu:2142/31919 2023-07-10 col_2142_5131 col_2142_14837 com_2142_5130 com_2142_14836 com_2142_234

dislocation Microstructural investigations of ion (Kr) irradiated UO2 text Stubbins, James F. Kleinfeldt, Brian 2012-06-27T21:19:20Z 2014-06-28T10:00:18Z 2012-05 2012-06-27T21:19:20Z 2012-05 A single crystal thin film of UO2 on a YSZ substrate was irradiated with 1MeV Kr ions at doses ranging from 1x1014 ions/cm2 to 1x1016 ions/cm2 and temperatures ranging from room temperature to 1000°C. These irradiations were conducted ex situ with one in situ irradiation at 800°C. Post irradiation examination was conducted using transmission electron microcopy to study and characterize the defect evolution in the microstructure. Results show defect nucleation with little growth at room temperature irradiations. As the temperature increases, defects nucleate and grow into dislocation loops and extended networks with increasing dose. At 600°C some dislocation loops form at high dose, but most of the defects remain small and isolated. The in situ 800°C experiment shows the most dislocation loop nucleation and growth. At 1000°C the defects grow at a much quicker rate than at lower temperatures, but anneal out as the dose and irradiation time increases. To summarize, the defect nucleation and growth is linked to the irradiation temperature. At lower temperatures, defects grow into a larger network of defects while at higher temperatures; the damage begins to heal through annealing. Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2012-04-25T15:28:07Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Kleinfeldt_Brian.docx: 13286897 bytes, checksum: 9462a984f489b2a81b37648ed124080a (MD5) Kleinfeldt_Brian.pdf: 3947408 bytes, checksum: 61b2f486025003a94c05fffb3027026d (MD5) Made available in DSpace on 2012-06-27T21:19:20Z (GMT). No. of bitstreams: 3 Kleinfeldt_Brian.pdf: 3947258 bytes, checksum: 415b68f11724a3f842dad3c5d2904641 (MD5) license.txt: 4066 bytes, checksum: 79d104a045130ee242b00bc10ab6b7f6 (MD5) Kleinfeldt_Brian.docx: 13287194 bytes, checksum: 689f7c89bf08596dbd472741d0a4b29d (MD5) Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by William Ingram (wingram2@illinois.edu) on 2012-06-27T21:24:31Z Item is restricted until 2014-06-27T21:24:27Z Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2014-06-28T10:00:18Z Item was in collections: Graduate Theses and Dissertations at Illinois (ID: 204) Dissertations and Theses - Nuclear, Plasma, and Radiological Engineering (ID: 693) No. of bitstreams: 3 Kleinfeldt_Brian.pdf: 3947258 bytes, checksum: 415b68f11724a3f842dad3c5d2904641 (MD5) license.txt: 4066 bytes, checksum: 79d104a045130ee242b00bc10ab6b7f6 (MD5) Kleinfeldt_Brian.docx: 13287194 bytes, checksum: 689f7c89bf08596dbd472741d0a4b29d (MD5) Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2014-06-28T10:00:18Z http://hdl.handle.net/2142/31919 en Copyright 2012 Brian Kleinfeldt materials science nuclear engineering uranium uranium oxide radiation radiation damage ion implantation Nuclear, Plasma, & Rad Engr 1973 Nuclear, Plasma, Radiolgc Engr 5183 University of Illinois at Urbana-Champaign Thesis M.S. MS: Nucl, Plasma, Rad Eng-UIUC 10KS5183MS