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        <identifier>oai:www.ideals.illinois.edu:2142/32089</identifier>
        <datestamp>2023-07-10</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:contributor>Chiang, Tai-Chang</dc:contributor>
          <dc:creator>Basile, Leonardo A.</dc:creator>
          <dc:date>2012-06-28T22:19:09Z</dc:date>
          <dc:date>2012-06-28T22:19:09Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>2005</dc:date>
          <dc:description>Real time in situ synchrotron x-ray studies of continuous Pb deposition on
Si(111)-(7 × 7) at 180 K reveal an unusual growth behavior. A wetting
layer forms first to cover the entire surface. Then islands of a fairly uniform
height of about five monolayers form on top of the wetting layer and grow
to fill the surface. The growth then switches to a layer-by-layer mode upon
further deposition. This behavior of alternating layer and island growth can
be attributed to spontaneous quantum phase separation based on a first
principles calculation of the system energy.
X-ray reflectivity measurements have been performed for an investigation
of the structure of Ag films deposited in situ on Ge(111) over the thickness
range of 3-15 monolayers. The films deposited at a substrate temperature
of 110 K are not well ordered, but become well ordered upon annealing, as
evidenced by substantial changes in the x-ray reflectivity data. The thickness
distribution for each annealed film, deduced from a fit to the reflectivity
data, is remarkably narrow, with just two or three adjacent discrete thicknesses
present, despite the large lattice mismatch between Ag and Ge. In
some cases, the film thickness is nearly atomically uniform. The results are
discussed in connection with recent models and theories of electronic effects
on the growth of ultrathin metal films.</dc:description>
          <dc:description>Submitted by Rachelle Ramer (rramer2@illinois.edu) on 2012-06-28T22:19:09Z
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  Previous issue date: 2005</dc:description>
          <dc:description>Restriction data tranferred 2014-07-01T11:10:54-05:00
Original Data
Group with Access UIUC Users [automated]
Release Date: none
Reason: thesis/dissertation</dc:description>
          <dc:description>Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Rachelle Ramer (rramer2@illinois.edu) on 2012-06-28T22:19:09Z
Item is restricted indefinitely.</dc:description>
          <dc:description>thesis/dissertation</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:identifier>Q. 530.4275 Tc5b</dc:identifier>
          <dc:identifier>FILM 2005 B292</dc:identifier>
          <dc:identifier>http://hdl.handle.net/2142/32089</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>©2005 Basile</dc:rights>
          <dc:subject>ultrathin metal films</dc:subject>
          <dc:subject>synchrotron x-ray</dc:subject>
          <dc:subject>x-ray reflectivity</dc:subject>
          <dc:title>X-ray studies of metal thin film growth on semiconductors</dc:title>
          <dc:type>Proposal</dc:type>
          <dc:type>Dissertation / Thesis</dc:type>
          <dc:type>text</dc:type>
          <degree>
            <department>Physics</department>
            <discipline>Physics</discipline>
            <disciplineCode>University of Illinois at Urbana-Champaign</disciplineCode>
            <level>Dissertation</level>
            <name>Ph.D.</name>
          </degree>
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