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        <datestamp>2023-07-11</datestamp>
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          <dc:contributor>Eden, James G.</dc:contributor>
          <dc:creator>Kim, Eung Soo</dc:creator>
          <dc:date>2012-09-18T21:23:30Z</dc:date>
          <dc:date>2012-09-18T21:23:30Z</dc:date>
          <dc:date>2014-09-18T10:00:56Z</dc:date>
          <dc:date>2012-08</dc:date>
          <dc:date>2012-09-18T21:23:30Z</dc:date>
          <dc:date>2012-08</dc:date>
          <dc:description>In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.</dc:description>
          <dc:description>Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2012-07-03T13:34:17Z
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Item is restricted until 2014-09-18T21:27:16Z</dc:description>
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Original Data
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          <dc:identifier>http://hdl.handle.net/2142/34514</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2012 Eung Soo Kim</dc:rights>
          <dc:subject>microplasma</dc:subject>
          <dc:subject>nanoplasma</dc:subject>
          <dc:subject>Paschen's curve</dc:subject>
          <dc:subject>pd curve</dc:subject>
          <dc:title>Confinement of microplasma in silicon trenches with widths as small as 2.5 μm</dc:title>
          <degree>
            <department>Electrical &amp; Computer Eng</department>
            <departmentCode>1933</departmentCode>
            <discipline>Electrical &amp; Computer Engr</discipline>
            <disciplineCode>1200</disciplineCode>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Thesis</level>
            <name>M.S.</name>
            <program>MS:Electr &amp; Computer Eng-UIUC</program>
            <programCode>10KS1200MS</programCode>
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