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        <datestamp>2023-07-11</datestamp>
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          <dc:creator>Voyles, Paul Marriner</dc:creator>
          <dc:date>2012-11-11T17:25:08Z</dc:date>
          <dc:date>2012-11-11T17:25:08Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>2001</dc:date>
          <dc:description>Fluctuation electron microscopy is a transmission electron microscopy technique
for studying medium-range order in disordered materials. We compute the variance for the image intensity of low-resolution hollow-cone dark field electron micrographs as a function of the diffracting condition and microscope resolution. The variance is sensitive to fluctuations in diffraction from mesoscopic volumes of the sample. It carries information about medium-range order via the three- and four-body atomic distribution functions. Fluctuation microscopy has been applied to the study of amorphous silicon, with and without alloying with hydrogen. We find that amorphous silicon has significant medium-range order, more than can be described by the conventional continuous random network model. The structure is better described by a paracrystalline model, which consists of strained topologically crystalline grains which may or may not be embedded in a more disordered matrix. Experiments show a continuous evolution of medium-range order in films deposited with increasing substrate temperature from the amorphous to polycrystalline regimes, which is counter to the belief that this structural transition is a discontinuous order-disorder phase transition. In the paracrystalline model, this increase is caused by the topologically crystalline grains growing, or occupying a greater volume fraction, or both. Experiments also show that hydrogenated amorphous silicon deposited by a variety of methods shares the paracrystalline structure. The medium-range order of hydrogenated amorphous silicon is affected by exposure to visible-spectrum white light. Films deposited by different methods have different responses, which may be connected to differences in the creation of metastable electrical defects known as the Staebler-Wronski effect.</dc:description>
          <dc:description>Submitted by Elias Lopez (erlopez2@illinois.edu) on 2012-11-11T17:25:08Z
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  Previous issue date: 2001</dc:description>
          <dc:description>Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Elias Lopez (erlopez2@illinois.edu) on 2012-11-14T02:27:19Z
Item is restricted indefinitely.</dc:description>
          <dc:description>Restriction data tranferred 2014-07-01T11:35:26-05:00
Original Data
Group with Access UIUC Users [automated]
Release Date: none
Reason: Publisher has not yet granted open access permission</dc:description>
          <dc:description>Publisher has not yet granted open access permission</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:identifier>http://hdl.handle.net/2142/35205</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>Voyles 2001 ©</dc:rights>
          <dc:subject>amorphous</dc:subject>
          <dc:subject>silicon</dc:subject>
          <dc:subject>microscopy</dc:subject>
          <dc:subject>diffraction</dc:subject>
          <dc:subject>paracrystalline</dc:subject>
          <dc:subject>dark-field</dc:subject>
          <dc:subject>medium-range order (mro)</dc:subject>
          <dc:subject>coherence</dc:subject>
          <dc:subject>semiconductors</dc:subject>
          <dc:subject>hydrogenated</dc:subject>
          <dc:subject>applescripts</dc:subject>
          <dc:title>Fluctuation Electron Microscopy of Medium-Range Order in Amorphous Silicon</dc:title>
          <dc:type>text</dc:type>
          <degree>
            <department>Physics</department>
            <discipline>Physics</discipline>
            <disciplineCode>University of Illinois at Urbana-Champaign</disciplineCode>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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