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        <identifier>oai:www.ideals.illinois.edu:2142/44109</identifier>
        <datestamp>2023-07-11</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:contributor>King, William P.</dc:contributor>
          <dc:creator>Liu, Joseph</dc:creator>
          <dc:date>2013-05-24T21:50:59Z</dc:date>
          <dc:date>2013-05-24T21:50:59Z</dc:date>
          <dc:date>2013-05</dc:date>
          <dc:date>2013-05-24T21:50:59Z</dc:date>
          <dc:date>2013-05</dc:date>
          <dc:description>This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).</dc:description>
          <dc:description>Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2013-04-24T22:02:01Z
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University of Illinois Theses &amp; Dissertations (ID: 1)
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          <dc:identifier>http://hdl.handle.net/2142/44109</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2013 Joseph Liu</dc:rights>
          <dc:subject>Atomic-force microscope (AFM)</dc:subject>
          <dc:subject>cantilever</dc:subject>
          <dc:subject>nanotopography</dc:subject>
          <dc:title>Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing</dc:title>
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            <department>Mechanical Sci &amp; Engineering</department>
            <departmentCode>1917</departmentCode>
            <discipline>Mechanical Engineering</discipline>
            <disciplineCode>0133</disciplineCode>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Thesis</level>
            <name>M.S.</name>
            <program>MS:Mechanical Engineerng -UIUC</program>
            <programCode>10KS0133MS</programCode>
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