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        <datestamp>2023-07-11</datestamp>
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          <dc:contributor>Mayeda, Watura</dc:contributor>
          <dc:creator>Robbins, David H.</dc:creator>
          <dc:date>2013-09-09T15:47:22Z</dc:date>
          <dc:date>2013-09-09T15:47:22Z</dc:date>
          <dc:date>1975</dc:date>
          <dc:description>Optimization of size is an important topic of research in the engineering of digital circuits. The field effect transistor (FET) is making an important contribution in this
area. In this paper, the basic properties of the FET which pertain to digital circuits will be examined. The problems associated with the physical layout of large integrated circuits using FETs will also be discussed and a standardized method of layout will be reviewed. A simple procedure for optimizing chip area when using this standardized layout
method will be developed and illustrated.</dc:description>
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  Previous issue date: 1975</dc:description>
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          <dc:language>en</dc:language>
          <dc:rights>Copyright 1975 David H. Robbins</dc:rights>
          <dc:subject>Field Effect Transistor (FET)</dc:subject>
          <dc:title>Optimum gate arrangements for MOS standardized layouts</dc:title>
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            <department>Electrical Engineering</department>
            <discipline>Electrical Engineering</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
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            <name>M.S.</name>
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