<?xml version="1.0" encoding="UTF-8"?>
<?xml-stylesheet type="text/xsl" href="/oai-pmh.xsl"?>
<OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd">
  <responseDate>2026-09-21T08:05:41Z</responseDate>
  <request identifier="oai:www.ideals.illinois.edu:2142/78544" metadataPrefix="etdms" verb="GetRecord">https://www.ideals.illinois.edu/oai-pmh</request>
  <GetRecord>
    <record>
      <header>
        <identifier>oai:www.ideals.illinois.edu:2142/78544</identifier>
        <datestamp>2023-07-11</datestamp>
        <setSpec>col_2142_5131</setSpec>
        <setSpec>col_2142_8888</setSpec>
        <setSpec>com_2142_5130</setSpec>
        <setSpec>com_2142_8887</setSpec>
        <setSpec>com_2142_234</setSpec>
      </header>
      <metadata>
        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:creator>Dai, Zhen</dc:creator>
          <dc:date>2015-07-22T22:18:06Z</dc:date>
          <dc:date>2015-07-22T22:18:06Z</dc:date>
          <dc:date>2015-05</dc:date>
          <dc:date>2015-04-30</dc:date>
          <dc:description>An aluminum/alumina (Al/Al2O3) microchannel plasma reactor is used to generate H2 with an energy efficiency of 2.5 % by dissociating water vapor in Ar at atmospheric pressure and room temperature. The value compares favorably to other plasma reactors reported in the literature, having reported energy efficiencies ≤ 2 %. Additionally, spectra of the Hα line are used to calculate electron densities, which are in the vicinity of 1.5 ± 0.2 × 1016 cm-3, while spectra of the OH(A-X) transition show a distinctly non-equilibrium population distribution in the OH(A2Σ+) state. Al/Al2O3 microchannel plasma device was shown to be efficient in water dissociation as compared with other plasma reactors recently reported in the literature.</dc:description>
          <dc:description>Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2015-07-22 without embargo terms</dc:description>
          <dc:description>The student, Zhen Dai, accepted the attached license on 2015-04-29 at 12:13.</dc:description>
          <dc:description>The student, Zhen Dai, submitted this Thesis for approval on 2015-04-29 at 12:19.</dc:description>
          <dc:description>This Thesis was approved for publication on 2015-04-30 at 10:23.</dc:description>
          <dc:description>DSpace SAF Submission Ingestion Package generated from Vireo submission #8184 on 2015-07-22 at 10:34:44</dc:description>
          <dc:description>Made available in DSpace on 2015-07-22T22:18:06Z (GMT). No. of bitstreams: 3
DAI-THESIS-2015.pdf: 963480 bytes, checksum: 575a51aaea0e9412fefb705987c11474 (MD5)
Zhen Dai.docx: 1068536 bytes, checksum: 02e286a0ed6ca47e2961150a8de37d00 (MD5)
LICENSE.txt: 4205 bytes, checksum: f65598edca930766207577976b34d29e (MD5)
  Previous issue date: 2015-04-30</dc:description>
          <dc:format>application/pdf</dc:format>
          <dc:identifier>http://hdl.handle.net/2142/78544</dc:identifier>
          <dc:date>2015-5</dc:date>
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2015 Zhen Dai</dc:rights>
          <dc:subject>Plasma</dc:subject>
          <dc:subject>Hydrogen</dc:subject>
          <dc:subject>Water Dissociation</dc:subject>
          <dc:subject>optical emission spectra (OES)</dc:subject>
          <dc:title>Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device</dc:title>
          <dc:type>text</dc:type>
          <dc:type>text</dc:type>
          <degree>
            <department>Electrical &amp; Computer Eng</department>
            <discipline>Electrical &amp; Computer Engr</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Thesis</level>
            <name>M.S.</name>
          </degree>
        </thesis>
      </metadata>
    </record>
  </GetRecord>
</OAI-PMH>
