2026-09-21T23:48:32Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/80677 2023-07-11 col_2142_5131 col_2142_8859 com_2142_5130 com_2142_8858 com_2142_234

Ruzic, David N. Juliano, Daniel Rene 2015-09-25T20:03:35Z 2015-09-25T20:03:35Z 10000-01-01 2000 2000 Third, a computer simulation was used to model the transport of sputtered atoms through the IPVD system. The simulation combines Monte Carlo and fluid methods to track the metal atoms that are emitted from the target, interact with the IPVD plasma, and are eventually deposited somewhere in the system. Ground-state neutral, excited, and ionized metal atoms are tracked. The simulation requires plasma conditions to be specified. The primary product of the simulation is a prediction of the ionization fraction of the sputtered atom flux at the substrate under various conditions. This quantity was experimentally measured and the results compared to the simulation. Made available in DSpace on 2015-09-25T20:03:35Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9955632.pdf: 11893453 bytes, checksum: 4cf0e7327d6dcc228674e27e0603a37c (MD5) Previous issue date: 2000 Embargo set by: Seth Robbins for item 81959 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 288 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000. http://hdl.handle.net/2142/80677 (MiAaPQ)AAI9955632 eng Engineering, Electronics and Electrical Modeling and Measurements of an Ionized Physical Vapor Depositon Device Plasma text Physics Physics University of Illinois at Urbana-Champaign Dissertation Ph.D.