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        <identifier>oai:www.ideals.illinois.edu:2142/80938</identifier>
        <datestamp>2023-07-11</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:contributor>Chang Liu</dc:contributor>
          <dc:creator>Wang, Xuefeng</dc:creator>
          <dc:date>2015-09-25T20:08:55Z</dc:date>
          <dc:date>2015-09-25T20:08:55Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>2005</dc:date>
          <dc:date>2005</dc:date>
          <dc:description>This work addresses two major challenges faced by traditional single-probe SPL technology---lithography throughput and probe coating technique. System-level improvements of SPL have been successfully achieved. First, micromachined, thermally actuated cantilever probe arrays are developed to improve the throughput and flexibility of SPL. Multiple distinct patterns have been generated simultaneously with sub-50-nm line width in dip pen nanolithography (DPN) mode. Then, development of scanning probe contact printing (SPCP) technology and multifunctional probe arrays has expanded the capability of conventional single-functional SPL and demonstrated an excellent example of a highly integrated scanning probe device for pattern generation in DPN and SPCP modes and pattern inspection in AFM and LFM modes. In addition, the development of integrated microfluidic inking chips for chemical ink handling and SPL probe treatment further enhances the power of arrayed scanning probes. The inking chip can potentially coat an array of SPL tips with different inks simultaneously for multi-ink lithography.</dc:description>
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  Previous issue date: 2005</dc:description>
          <dc:description>Embargo set by: Seth Robbins for item 82220
Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:description>Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:description>143 p.</dc:description>
          <dc:description>Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005.</dc:description>
          <dc:identifier>http://hdl.handle.net/2142/80938</dc:identifier>
          <dc:identifier>(MiAaPQ)AAI3199167</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:subject>Engineering, Electronics and Electrical</dc:subject>
          <dc:title>Microelectromechanical and Microfluidic Systems for Scanning Probe Lithography</dc:title>
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            <department>Electrical Engineering</department>
            <discipline>Electrical Engineering</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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