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          <dc:contributor>Aluru, Narayana R.</dc:contributor>
          <dc:creator>Xu, Yang</dc:creator>
          <dc:date>2015-09-25T20:09:47Z</dc:date>
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          <dc:date>2009</dc:date>
          <dc:date>2009</dc:date>
          <dc:description>In addition to the multiscale method, we present an ab initio  study of electronic properties of graphene flakes and nanoribbons adsorbed on clean and H-passivated (100) silicon surfaces. The graphene electronic properties are not perturbed by the H-passivated Si substrate. In contrast, the interaction between the clean Si surface and graphene can significantly change the bandstructure of graphene. This is caused by the covalent bonding formed by C and surface Si atoms, which changes the pi-band network of the graphene layer. The dispersion curves and density of states calculations show that the bonded Si-C surface states are highly delocalized and located near the Fermi energy. Adsorption energy indicates that the graphene flakes and nanoribbons are stable on clean Si(100) surfaces.</dc:description>
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  Previous issue date: 2009</dc:description>
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Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
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          <dc:description>109 p.</dc:description>
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          <dc:subject>Nanotechnology</dc:subject>
          <dc:title>Electrostatic Analysis of Nanoelectromechanical Systems</dc:title>
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            <discipline>Electrical and Computer Engineering</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
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