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          <dc:contributor>Seth Hutchinson</dc:contributor>
          <dc:creator>Castano, Rebecca L.</dc:creator>
          <dc:date>2015-09-25T20:10:06Z</dc:date>
          <dc:date>2015-09-25T20:10:06Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>1998</dc:date>
          <dc:date>1998</dc:date>
          <dc:description>We present improved yield models that can be used for a broader range of printed patterns. We also enhance the defect geometry models that are commonly used today. We introduce a defect geometry model that is based on the physical process of defect formation. Our defect geometry model employs Markov random fields to represent more general defect shapes. Yield is estimated using Monte Carlo sampling methods. Finally, we present methods for estimating the parameters of the yield models using observed data from the manufacturing process.</dc:description>
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  Previous issue date: 1998</dc:description>
          <dc:description>Embargo set by: Seth Robbins for item 82501
Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
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          <dc:description>129 p.</dc:description>
          <dc:description>Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.</dc:description>
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          <dc:identifier>(MiAaPQ)AAI9834658</dc:identifier>
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          <dc:subject>Engineering, Packaging</dc:subject>
          <dc:title>Models for Yield Estimation of Multichip Module Ceramic Substrates</dc:title>
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            <grantor>University of Illinois at Urbana-Champaign</grantor>
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