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        <identifier>oai:www.ideals.illinois.edu:2142/81257</identifier>
        <datestamp>2023-07-11</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:date>1998</dc:date>
          <dc:date>1998</dc:date>
          <dc:contributor>Lyding, Joseph W.</dc:contributor>
          <dc:creator>Abeln, Glenn Charles</dc:creator>
          <dc:date>2015-09-25T20:10:17Z</dc:date>
          <dc:date>2015-09-25T20:10:17Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:description>"The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized ""templates"" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described."</dc:description>
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  Previous issue date: 1998</dc:description>
          <dc:description>Embargo set by: Seth Robbins for item 82538
Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:description>Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:description>81 p.</dc:description>
          <dc:description>Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.</dc:description>
          <dc:identifier>http://hdl.handle.net/2142/81257</dc:identifier>
          <dc:identifier>(MiAaPQ)AAI9912182</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:subject>Engineering, Materials Science</dc:subject>
          <dc:title>Fabrication of Metal and Organic Nanostructures on Silicon(100) With Scanning Tunneling Microscope-Based Lithography</dc:title>
          <dc:type>text</dc:type>
          <degree>
            <department>Electrical Engineering</department>
            <discipline>Electrical Engineering</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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