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          <dc:contributor>Stillman, Gregory E.</dc:contributor>
          <dc:creator>Hartmann, Quesnell Jacob</dc:creator>
          <dc:date>2015-09-25T20:10:36Z</dc:date>
          <dc:date>2015-09-25T20:10:36Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>1998</dc:date>
          <dc:date>1998</dc:date>
          <dc:description>Although device physics and semiconductor theory were an essential part of this research, few new theoretical calculations or predictions were made. Rather, this thesis relied heavily on the work of those, who early in the history of semiconductors, developed the theories of minority carrier injection, heterojunction effects, bandgap engineering, and carbon-doping. The work described here is mostly an exercise in applying these theories to produce a manufacturable, high-performance transistor capable of meeting the demands of modern electronics.</dc:description>
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  Previous issue date: 1998</dc:description>
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Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
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          <dc:subject>Engineering, Electronics and Electrical</dc:subject>
          <dc:title>Growth and Design of High-Performance InGaP/GaAs Heterojunction Bipolar Transistors Grown by Low -Pressure Metalorganic Chemical Vapor Deposition</dc:title>
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            <grantor>University of Illinois at Urbana-Champaign</grantor>
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