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oai:www.ideals.illinois.edu:2142/82412 2023-07-11 col_2142_5131 col_2142_11615 com_2142_5130 com_2142_9130 com_2142_8903

Alkire, Richard C. Stephens, Ryan Mark 2015-09-25T20:43:38Z 2015-09-25T20:43:38Z 10000-01-01 2008 2008 A two-step approach was used to calculate the spatial distribution of nucleation events on an electrode undergoing deposition by electrolysis under the influence of mass transport. The simulations were carried out by first, calculating the time-dependent concentration profiles in the vicinity of a hemispherical nucleus, then using the concentration profiles as boundary conditions for a surface simulation that relied on the island dynamics algorithm. The model additive system was found to uniformize the distribution of nuclei on the simulated surface, leading to a significant reduction in the size of nucleation exclusion zones. Made available in DSpace on 2015-09-25T20:43:38Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3337829.pdf: 10733367 bytes, checksum: afe3966dce27c8453fe3f1f04bc9470c (MD5) Previous issue date: 2008 Embargo set by: Seth Robbins for item 83693 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 226 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2008. http://hdl.handle.net/2142/82412 (MiAaPQ)AAI3337829 eng Engineering, Materials Science Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films text Chemical Engineering Chemical Engineering University of Illinois at Urbana-Champaign Dissertation Ph.D.