2026-09-22T09:16:38Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/82709 2023-07-11 col_2142_5131 col_2142_13836 com_2142_5130 com_2142_13835 com_2142_234

Payne, David A. Hemjinda, Sarunya 2015-09-25T20:52:34Z 2015-09-25T20:52:34Z 10000-01-01 2001 2001 A chemical-solution deposition method was used to integrate thin films of Ta2O5-TiO2 onto silicon substrates. Precursor solutions were successfully prepared using Ta(OEt)5 and Ti(OEt) 4 in ethanol. Solution stability was shown to be influenced by several factors, including, Rw ratio, additions of HCl, and, most importantly, conditions of hydrolysis. Electrical measurements revealed that amorphous films exhibited the most favorable dielectric properties, with low tandelta = 0.005 and K' = 27. Made available in DSpace on 2015-09-25T20:52:34Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3030436.pdf: 7887973 bytes, checksum: 7d0bc11428865507debfed3379bd6fbc (MD5) Previous issue date: 2001 Embargo set by: Seth Robbins for item 83990 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 191 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001. http://hdl.handle.net/2142/82709 (MiAaPQ)AAI3030436 eng Engineering, Materials Science Preparations and Characterizations of Tantalum Pentoxide-Titanium Dioxide: Ceramics and Thin Films text Materials Science and Engineering Materials Science and Engineering University of Illinois at Urbana-Champaign Dissertation Ph.D.