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        <identifier>oai:www.ideals.illinois.edu:2142/82823</identifier>
        <datestamp>2023-07-11</datestamp>
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          <dc:contributor>Phillip Geil</dc:contributor>
          <dc:creator>Singh, Ravindra Pratap</dc:creator>
          <dc:date>2015-09-25T20:53:10Z</dc:date>
          <dc:date>2015-09-25T20:53:10Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>2008</dc:date>
          <dc:date>2008</dc:date>
          <dc:description>Deposition of TiO2 and silver thin films using multi jet FFESS is studied, demonstrating great control on film morphology and properties. TiO2 thin films deposited on high-intensity discharge arc lamps are found to improve the quality of its light output. Silver thin films of high purity and conductivity, and with good adhesion, could be deposited at relatively high deposition rates and high deposition efficiency as compared to CVD techniques.</dc:description>
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  Previous issue date: 2008</dc:description>
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Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
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          <dc:subject>Physics, Theory</dc:subject>
          <dc:title>An Investigation of Flow-Limited Field-Injection Electrostatic Spraying (Ffess) and Its Applications to Thin Film Deposition</dc:title>
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            <grantor>University of Illinois at Urbana-Champaign</grantor>
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