2026-09-21T04:51:42Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/82937 2023-07-11 col_2142_5131 col_2142_13836 com_2142_5130 com_2142_13835 com_2142_234

Kushner, Mark J. Zhang, Da 2015-09-25T20:53:42Z 2015-09-25T20:53:42Z 10000-01-01 2000 2000 Surface reactions occurring in fluorocarbon plasmas also influence plasma properties by consuming or generating plasma fluxes. Of particular interest is the effect that surfaces have on CF2 densities, as CF2 is a precursor for polymer formation. These processes were investigated with the integrated plasma-surface model. Simulations demonstrated that CF 2 self-sticking is a loss at the surface, while ion sputtering and large ion dissociation can generate CF2 at surfaces. The net effect of the surface depends on the relative magnitudes of the loss and generation reactions. Made available in DSpace on 2015-09-25T20:53:42Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9990206.pdf: 5702754 bytes, checksum: fa7da33c8265d929efe7e46770492d20 (MD5) Previous issue date: 2000 Embargo set by: Seth Robbins for item 84218 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 155 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000. http://hdl.handle.net/2142/82937 (MiAaPQ)AAI9990206 eng Engineering, Chemical Surface Reaction Mechanisms in Plasma Etching Processes text Materials Science and Engineering Materials Science and Engineering University of Illinois at Urbana-Champaign Dissertation Ph.D.