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S. Pratap Vanka Luo, Gang 2015-09-25T21:12:10Z 2015-09-25T21:12:10Z 10000-01-01 2003 2003 Next, an understanding the influence of the transient operating conditions in the prototypical CVD reactor was sought. Film growth rate shows time varying pattern due to the transient operating conditions. But it oscillates between two end steady states. Thus, it is observed that film growth rate and uniformity cannot be improved by applying pulse sequence of precursor gas, pulse sequence of inlet mass flow rate, and time-varying rotation speed of the wafer. Made available in DSpace on 2015-09-25T21:12:10Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3111576.pdf: 5825986 bytes, checksum: 8b39a396f11a57d28e17ea21fea2bd5f (MD5) Previous issue date: 2003 Embargo set by: Seth Robbins for item 85083 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 137 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2003. http://hdl.handle.net/2142/83802 (MiAaPQ)AAI3111576 eng Engineering, Mechanical Study of Buoyancy -Induced Flows in a Prototypical CVD Reactor text Mechanical Engineering Mechanical Engineering University of Illinois at Urbana-Champaign Dissertation Ph.D.