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        <identifier>oai:www.ideals.illinois.edu:2142/84062</identifier>
        <datestamp>2023-07-11</datestamp>
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          <dc:description>Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2002.</dc:description>
          <dc:identifier>http://hdl.handle.net/2142/84062</dc:identifier>
          <dc:identifier>(MiAaPQ)AAI3044104</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:description>U of I Only</dc:description>
          <dc:description>128 p.</dc:description>
          <dc:subject>Engineering, Materials Science</dc:subject>
          <dc:contributor>Girolami, Gregory S.</dc:contributor>
          <dc:contributor>Nuzzo, Ralph G.</dc:contributor>
          <dc:creator>Harada, Yoshiko</dc:creator>
          <dc:date>2015-09-25T22:12:40Z</dc:date>
          <dc:date>2015-09-25T22:12:40Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>2002</dc:date>
          <dc:date>2002</dc:date>
          <dc:description>Two examples of Si patterning via microcontact printing (muCP) are given in this thesis. In both cases, Si substrates were patterned with OTS by MCP to protect the underlying substrate. The first example shows the use of an OTS template in orthogonal printing of OCT to activate OTS-free areas, followed by surface-initiated ring-opening metathesis polymerization (ROMP) of strained olefins to amplify the original pattern inscribed by muCP In the second example, an OTS template was used to selectively deposit a Pt(O) complex, which was used in Pt-assisted etching of Si(100) to produce porous silicon structures in the Pt-coated regions.</dc:description>
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license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5)
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  Previous issue date: 2002</dc:description>
          <dc:description>Embargo set by: Seth Robbins for item 85343
Lift date: Forever
Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:description>Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs</dc:description>
          <dc:title>Amplification of Soft Lithographic Patterning of Silicon</dc:title>
          <dc:type>text</dc:type>
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            <department>Chemistry</department>
            <discipline>Chemistry</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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