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Walter G. Kemperer Westwood, Glenn 2015-09-25T22:13:16Z 2015-09-25T22:13:16Z 10000-01-01 2004 2004 Solution deposition from Zr4(OPrn) 16 was also used to deposit ultrathin zirconia films on gold, silver, and aluminum surfaces. X-ray photoelectron spectroscopy and atomic force microscopy were used to compare the physical properties of these films. Electrical measurements showed that zirconia films on Ag and Au are not insulating, but aluminum-zirconia-aluminum capacitors fabricated by this method displayed capacitance densities between 0.09 tauo 0.50 muF/cm2 (tan delta = 0.09 to 1.12) and current densities between 10-2 to 10-4 A/cm2. Made available in DSpace on 2015-09-25T22:13:16Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3153460.pdf: 10662545 bytes, checksum: a3121062de477e5ae8a5e1319bcfc09a (MD5) Previous issue date: 2004 Embargo set by: Seth Robbins for item 85445 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 126 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2004. http://hdl.handle.net/2142/84164 (MiAaPQ)AAI3153460 eng Physics, Condensed Matter Solution-Based Deposition of Ultrathin Metal Oxide Films on Metal and Superconductor Surfaces text Chemistry Chemistry University of Illinois at Urbana-Champaign Dissertation Ph.D.