2026-09-23T00:08:40Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/84260 2023-07-11 col_2142_5131 col_2142_14789 com_2142_5130 com_2142_14788 com_2142_8903

Girolami, Gregory S. Kim, Do Young 2015-09-25T22:13:41Z 2015-09-25T22:13:41Z 10000-01-01 2007 2007 The first low-temperature chemical vapor depositions of doped MgB 2 phases have been achieved by passing the precursor Mg(H3BNMe 2BH3)2 over a surface in the presence of a catalyst that accelerates the rate of the CVD growth reaction. Transition metal hydroborates can serve as effective catalysts, of which Ti(H3BNMe2BH 3)2 is the most attractive so far because it leads to the lowest level of Mg site substitution; the resulting film stoichiometry is Mg0.8Ti0.2B2. Although the metal substitution renders the films non-superconducting above 4 K, the results clearly point the way to the development of technologically-attractive CVD processes to grow superconducting MgB2 thin films at temperatures below 400°C. Made available in DSpace on 2015-09-25T22:13:41Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3269943.pdf: 4850501 bytes, checksum: 5d15e19ee66a82e35f0974541efcd68c (MD5) Previous issue date: 2007 Embargo set by: Seth Robbins for item 85541 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 209 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007. http://hdl.handle.net/2142/84260 (MiAaPQ)AAI3269943 eng Engineering, Materials Science Part I. Synthesis of Metal Hydroborates as Potential Chemical Vapor Deposition Precursors. Part II. Chemical Vapor Deposition of Titanium-Doped Magnesium Diboride Thin Films text Chemistry Chemistry University of Illinois at Urbana-Champaign Dissertation Ph.D.