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oai:www.ideals.illinois.edu:2142/84480 2023-07-11 col_2142_5131 col_2142_14789 com_2142_5130 com_2142_14788 com_2142_8903

http://hdl.handle.net/2142/84480 Nuzzo, Ralph G. Finnie, Krista Renee 2015-09-25T22:14:44Z 2015-09-25T22:14:44Z 10000-01-01 2000 2000 A methodology for controlling the nanoscale architecture of etched silicon was developed though the printing of mixed monolayers. Contact printing of mixed solutions of different mole fractions of DTS and octyltrichlorosilane (OCTY) were formed monolayers on Si. Once annealed in air, these films were placed into KOH etching solutions and the resulting grain structures were examined via AFM. The data showed that different mole fractions created different grain structures after exposure to the etching solution. Additionally, the resulting etch structures were tested for photoluminescence, though only weak PL was found. Made available in DSpace on 2015-09-25T22:14:44Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9989994.pdf: 5435464 bytes, checksum: 054becc83974b631849ef74ce5881ac5 (MD5) Previous issue date: 2000 Embargo set by: Seth Robbins for item 85761 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 136 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000. (MiAaPQ)AAI9989994 eng Chemistry, Inorganic Soft Lithographic Patterning on Silicon text Chemistry Chemistry University of Illinois at Urbana-Champaign Dissertation Ph.D.