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Ruzic, David N. Hayden, Douglas Brenton 2015-09-28T14:51:24Z 2015-09-28T14:51:24Z 10000-01-01 1999 1999 The helicon antenna sits remotely outside the vacuum system, so all shadowing and contamination problems which the other two sources exhibit are eliminated. Ionization fractions to the substrate of 51 +/- 10% with a deposition rate of 847 +/- 42 A/min. are found. Without the antenna, the ionization fraction is 30 +/- 6% and the deposition rate is 815 +/- 41 A/min. This remote source is envisioned to sit six or more around a sputtering chamber, which can help control uniformity while increasing the ionization further. Since an increase of 20% in the ionization fraction is achieved with only one antenna, and there is no threat of contamination inside the vacuum chamber, the helicon source is concluded to have the highest potential of these three secondary sources in an industrial IPVD application. Made available in DSpace on 2015-09-28T14:51:24Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9944877.pdf: 6306236 bytes, checksum: dbab2fb39604343ad3fd67880ad10c5d (MD5) Previous issue date: 1999 Embargo set by: Seth Robbins for item 87227 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs U of I Only 138 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1999. http://hdl.handle.net/2142/85946 (MiAaPQ)AAI9944877 eng Engineering, Nuclear Secondary Plasma Sources for Ionized Physical Vapor Deposition text Nuclear Engineering Nuclear Engineering University of Illinois at Urbana-Champaign Dissertation Ph.D.