<?xml version="1.0" encoding="UTF-8"?>
<?xml-stylesheet type="text/xsl" href="/oai-pmh.xsl"?>
<OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd">
  <responseDate>2026-09-20T03:53:02Z</responseDate>
  <request identifier="oai:www.ideals.illinois.edu:2142/90654" metadataPrefix="etdms" verb="GetRecord">https://www.ideals.illinois.edu/oai-pmh</request>
  <GetRecord>
    <record>
      <header>
        <identifier>oai:www.ideals.illinois.edu:2142/90654</identifier>
        <datestamp>2023-07-11</datestamp>
        <setSpec>col_2142_5131</setSpec>
        <setSpec>com_2142_5130</setSpec>
      </header>
      <metadata>
        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2016 Weicheng Zhong</dc:rights>
          <dc:subject>Cladding</dc:subject>
          <dc:subject>FeCrAl</dc:subject>
          <dc:contributor>Heuser, Brent J.</dc:contributor>
          <dc:creator>Zhong, Weicheng</dc:creator>
          <dc:date>2016-07-07T19:58:05Z</dc:date>
          <dc:date>2016-07-07T19:58:05Z</dc:date>
          <dc:date>2016-04-29</dc:date>
          <dc:date>2016-05</dc:date>
          <dc:description>Iron-Chromium-Aluminum (FeCrAl) thin films have been deposited on Zircaloy-2 (Zry2) and yttria-stabilized zirconia (YSZ) by magnetron sputtering, and they have been tested with respect to the oxidation weight gain in high temperature steam. In 700C steam environment, the FeCrAl-coated Zry2 samples have significantly reduced the oxidation rate, compared to the uncoated Zry2. Alumina was promoted for FeCrAl with high Al composition, and a parabolic alumina growth rate under 700_C steam exposure was quantified by AES depth profile. Zirconia formation was inhibited by the FeCrAl coating. A thicker film proved to be more protective, and delayed zirconia formation for a longer time. In 1100C steam environment, a complete film loss was observed due to the low eutectic temperature (950C) of the Fe-Zr binary system.</dc:description>
          <dc:description>Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2016-07-07 without embargo terms</dc:description>
          <dc:description>The student, Weicheng Zhong, accepted the attached license on 2016-04-26 at 09:51.</dc:description>
          <dc:description>The student, Weicheng Zhong, submitted this Thesis for approval on 2016-04-26 at 10:10.</dc:description>
          <dc:description>This Thesis was approved for publication on 2016-04-29 at 10:34.</dc:description>
          <dc:description>DSpace SAF Submission Ingestion Package generated from Vireo submission #9496 on 2016-07-07 at 13:33:16</dc:description>
          <dc:description>Made available in DSpace on 2016-07-07T19:58:05Z (GMT). No. of bitstreams: 2
ZHONG-THESIS-2016.pdf: 39396608 bytes, checksum: a492e6aeaa0a6e764586be8eda73236c (MD5)
LICENSE.txt: 4211 bytes, checksum: 1a97b7e052423f921fae4c7accc55485 (MD5)
  Previous issue date: 2016-04-29</dc:description>
          <dc:format>application/pdf</dc:format>
          <dc:identifier>http://hdl.handle.net/2142/90654</dc:identifier>
          <dc:subject>Zircaloy</dc:subject>
          <dc:subject>coating</dc:subject>
          <dc:subject>oxidation</dc:subject>
          <dc:title>Characterization of Iron-Chromium-Aluminum surface coated Zircaloy-2 under high temperature steam</dc:title>
          <dc:type>text</dc:type>
          <dc:type>text</dc:type>
          <degree>
            <department>Nuclear, Plasma, &amp; Rad Engr</department>
            <discipline>Nuclear, Plasma, Radiolgc Engr</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Thesis</level>
            <name>M.S.</name>
          </degree>
        </thesis>
      </metadata>
    </record>
  </GetRecord>
</OAI-PMH>
