Process development and fabrication of photonic crystal based III-V semiconductor optical sources
Pandey, Sanat
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https://hdl.handle.net/2142/120462
Description
Title
Process development and fabrication of photonic crystal based III-V semiconductor optical sources
Author(s)
Pandey, Sanat
Issue Date
2023-05-05
Director of Research (if dissertation) or Advisor (if thesis)
Choquette, Kent D
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
Photonic crystal, VCSEL, PCSEL
Abstract
Semiconductor laser diodes play a vital role in modern technology- in such applications as facial recognition and high-speed data transmission for which efficient operation in single mode emission is desired. Vertical Cavity Surface Emitting Laser (VCSEL) diodes are at the forefront for these applications and there has been significant development in VCSEL technology over the years. It is essential to maintain the single mode properties of VCSELs while also increasing power and efficiency. Photonic Crystal Surface Emitting Lasers (PCSELs) are promising sources for single mode high power and high brightness applications. The aim of this thesis is to develop fabrication techniques for advanced VCSEL and PCSEL device manufacture. The photolithography, hard mask etches, and III-V etch processes have been used and modified to attain more controllability over the PhC definition and dimensions. Moreover, for high power and mode control of the light emitted, InP based PCSEL process development and fabrication was done. A high index contrast structure was designed, and a material science test was carried out to see the feasibility of the structure.
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