University of Illinois Urbana-Champaign

Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

Stromberg, Lauren L.

Content Files
1_Stromberg_Lauren.pdf

Permalink

https://hdl.handle.net/2142/16004

Description

Title
Application of layout and topology optimization using pattern gradation for the conceptual design of buildings
Author(s)
Stromberg, Lauren L.
Issue Date
2010-05-18T18:55:53Z
Director of Research (if dissertation) or Advisor (if thesis)
Paulino, Glaucio H.
Department of Study
Civil & Environmental Eng
Discipline
Civil Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Date of Ingest
2010-05-18T18:55:53Z
Keyword(s)
  • topology optmization
  • pattern gradation
  • material layout
  • high-rise buildings
  • pattern constraints
Abstract
This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.
Graduation Semester
2010-5
Permalink
http://hdl.handle.net/2142/16004
Copyright and License Information
Copyright 2010 by Lauren Lynne Stromberg. All rights reserved.

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Dissertations and Theses - Civil and Environmental Engineering
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Graduate Theses and Dissertations at Illinois