Design and fabrication of novel and functional 3D structures via proximity field nano-patterning

Gupta, Sidhartha

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https://hdl.handle.net/2142/42492 Copy

Description

Title

Design and fabrication of novel and functional 3D structures via proximity field nano-patterning

Author(s)

Gupta, Sidhartha

Issue Date

2013-02-03T19:47:38Z

Director of Research (if dissertation) or Advisor (if thesis)

Braun, Paul V.

Doctoral Committee Chair(s)

Braun, Paul V.

Committee Member(s)

• Wiltzius, Pierre
• Martin, Lane W.
• King, William P.
• Eden, James G.

Department of Study

Materials Science & Engineerng

Discipline

Materials Science & Engr

Degree Granting Institution

University of Illinois at Urbana-Champaign

Degree Name

Ph.D.

Degree Level

Dissertation

Keyword(s)

• Lithography
• Optics
• Optical Lithography
• Interference Lithography
• Nanotechnology
• Materials Science
• Metamaterials
• Chiral Structures
• Periodic 3D Structures
• Phase mask lithography
• Proximity Field Nano-Patterning (PnP)

Abstract

Proximity field Nano-Patterning (PnP) is a large-area interference lithography technique that is used to fabricate multi-dimensionally periodic micro-structures. Though a potent technique for 3D microfabrication that offers dual and superior advantage of scalable resolution and throughput, this technique has not seen broader adoption due to the lack of concerted design and fabrication strategies that would enable the ability to target, design for and fabricate functional structures. This work endeavors to address this critical gap. A broad genetic algorithm based inverse design technique is developed that allows the ability to design PnP experiments that can target any arbitrary structure. Furthermore, the technique of enhanced PnP (ePnP) and nano-indentation PnP (NI-PnP) are developed and demonstrated. ePnP serves to improve to address the gap between the different aspects of fabricability associated with a PnP design. NI-PnP is used as a method of fabricating gratings with multiple levels and/or complex topologies as an alternative to the more common bilevel gratings that are used as diffractive optical elements (DOE) for PnP. This move results in a significantly expanded 3D structure motif design space that can be exploited with the genetic algorithm based inverse design approach. Finally, PnP is used to demonstrate the fabrication of high quality chiral structures with sub-micron pitches – the first demonstration of chiral structures via PnP and the first repeatable demonstration with any form of interference lithography.

Graduation Semester

2012-12

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http://hdl.handle.net/2142/42492

Copyright and License Information

Copyright 2012 Sidhartha Gupta

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